Abstract
As an ideal platform for photonic integrated circuits, silicon nitride material is explored. In particular, we investigate residual stress and cracking limits in SiNₓ films through experimental and computational approaches, as well as plasma-based SiNₓ nanopatterning.
| Original language | English |
|---|---|
| Pages (from-to) | 353 |
| Number of pages | 1 |
| Journal | International Conference on Metamaterials, Photonic Crystals and Plasmonics |
| Publication status | Published - 2025 |
| Externally published | Yes |
| Event | 15th International Conference on Metamaterials, Photonic Crystals and Plasmonics, META 2025 - Malaga, Spain Duration: 22 Jul 2025 → 25 Jul 2025 |
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